Driven by the restructuring of the global semiconductor supply chain and policies promoting domestic substitution, the independent supply of ArF, KrF, and electron beam photoresists has become a key focus for China’s materials industry. The capability for fine synthesis and ultra-high purity control of intermediates has emerged as a critical bottleneck restricting the localization of photoresists.

In recent years, multiple downstream photoresist manufacturers have increased their collaboration with domestic intermediate producers, with particular attention to special-structure compounds such as aliphatic alcohol monomers, alkyl acrylates, and fluorinated monomers, which involve multiple synthesis steps.

Catsyn New Materials has established a multi-step synthesis platform supporting fluorination, catalysis, chiral construction, and other complex synthetic routes. Equipped with high-pressure reactors and LC-MS analytical systems, and utilizing chelation/ion exchange processes, the company can control metal impurity levels to the ppb range, enabling customers to achieve seamless transition from lab-scale sampling to pilot-scale verification.